Adisorn Buranawong
Material Innovation Research Laboratory, Department of Physics, Faculty of Sciences, Burapha University
Nirun Witit-anun
Material Innovation Research Laboratory, Department of Physics, Faculty of Sciences, Burapha University
DOI: https://doi.org/10.14456/apst.2025.43
Keywords: Chromium content Hardness Hard coating Thin film TiCrN Reactive magnetron sputtering
Abstract
The aim of this study was to investigate the effects of chromium (Cr) content on the structure and hardness of titanium chromium nitride (TiCrN) thin films deposited on Si substrates using reactive direct current magnetron sputtering from mosaic Ti-Cr targets. The crystal structure, chemical composition, surface morphology, microstructure, and hardness of the thin films were characterized by X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM), and nano-indentation. The results showed that the as-deposited films were formed as (Ti, Cr)N solid solutions with face-centered cubic structures in the (111), (200), and (220) planes, as determined from the XRD patterns. The lattice parameters were in the range of 4.206–4.282 Å with a nanocrystalline structure, and the average crystal size was 13.3–15.7 nm. According to the EDS analysis results, the Ti, Cr, and N contents were observed at different ratios. According to the microscopic FE-SEM image, the Cr content influences the surface morphology and cross-section of the deposited film. According to the nano-indentation results, the hardness of the deposited films increased and then decreased (12.17–15.64 GPa) with increasing Cr content. The highest hardness was obtained at a Cr content of 20.28 at.% with an average crystallite size of 13.4 nm.
How to Cite
Buranawong, A., & Witit-anun, N. (2025). Effect of Cr Content on Structure and Hardness of TiCrN Thin Films. Asia-Pacific Journal of Science and Technology, 30(03), APST–30. https://doi.org/10.14456/apst.2025.43
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